The 8 inch ventilation quartz inner tube is designed for precise gas flow control and thermal isolation within semiconductor furnace systems. Made from high-purity fused quartz, it exhibits excellent resistance to thermal shock, chemical corrosion, and particle contamination—making it ideal for demanding high-temperature processes.

As an inner component of double-tube furnace structures, this quartz tube directs process gases uniformly over wafer surfaces while maintaining separation from the furnace wall. Its optimized geometry enhances laminar flow, reduces boundary layer effects, and supports consistent deposition or diffusion results across 200 mm wafers.